Published November 15, 2010 | Version v1
Journal article

Tuning the electron injection barrier between Co and C60 using Alq3 buffer layer

  • 1. Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore)
  • 2. Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543 (Singapore)
  • 3. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, P.O. Box 800-204, Shanghai 201800 (China)

Description

We demonstrate that the electron injection barrier (Δe) between Co and C60 can be tuned by inserting a thin Alq3 interlayer. Using ultraviolet photoemission spectroscopy, Δe of C60 on Alq3-predecorated Co (Δe=0.3 eV) was found to be reduced by 0.3 eV compared with that of C60 deposited directly on the bare Co metal surface (Δe=0.6 eV). Due to Fermi level pining at the Alq3/Co interface, this tuning effect is independent of the thickness of Alq3 interlayer from multilayer to monolayer. Based on the experimental results, band level alignment diagrams are proposed for C60/Co and C60/Alq3/Co interfaces with two different Alq3 thicknesses. Our findings could have potential applications for the reduction in the carrier injection barrier in organic spin valves.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
108
Journal Issue
10
Journal Page Range
p. 103719-103719.5
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2010 American Institute of Physics