Published December 2009 | Version v1
Journal article

Customizing electron confinement in plasma-assembled Si/AlN nanodots for solar cell applications

  • 1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616 Singapore (Singapore)
  • 2. Plasma Nanoscience Center Australia (PNCA), CSIRO Materials Science and Engineering, Lindfield, New South Wales 2070 (Australia)
  • 3. Institute of Solid State Physics, Sichuan Normal University, Chengdu 610068 (China)
  • 4. Jozef Stefan Institute, Jamova 39, SI-1000 Ljubljana (Slovenia)
  • 5. School of Physics, University of Sydney, Sydney, New South Wales 2006 (Australia)

Description

Size-uniform Si nanodots (NDs) are synthesized on an AlN buffer layer at low Si(111) substrate temperatures using inductively coupled plasma-assisted magnetron sputtering deposition. High-resolution electron microscopy reveals that the sizes of the Si NDs range from 9 to 30 nm. Room-temperature photoluminescence (PL) spectra indicate that the energy peak shifts from 738 to 778 nm with increasing the ND size. In this system, the quantum confinement effect is fairly strong even for relatively large (up to 25 nm in diameter) NDs, which is promising for the development of the next-generation all-Si tandem solar cells capable of effectively capturing sunlight photons with the energies between 1.7 (infrared: large NDs) and 3.4 eV (ultraviolet: small NDs). The strength of the resulting electron confinement in the Si/AlN ND system is evaluated and justified by analyzing the measured PL spectra using the ionization energy theory approximation.

Additional details

Identifiers

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
16
Journal Issue
12
Journal Page Range
p. 123504-123504.5
ISSN
1070-664X
CODEN
PHPAEN

Optional Information

Notes
(c) 2009 American Institute of Physics