Published August 2021 | Version v1
Journal article

DFT study of silicene on metal (Al, Ag, Au) substrates of various thicknesses

  • 1. Ural Federal University named after the first President of Russia B.N. Yeltsin, Mira Str., 19, Yekaterinburg 620002 (Russian Federation)
  • 2. Institute of High-Temperature Electrochemistry, Ural Branch of Russian Academy of Sciences, Academicheskaya Str., 20, Yekaterinburg 620990 (Russian Federation)

Description

Highlights: • The silicene-based materials are promising for microelectronic applications. • Silicene on aluminum, silver and gold substrate becomes a conductive material. • The adhesion of silicene to metal substrates decreases in the sequence: Ag, Al, Au. • Al (111) substrate gives a uniform distribution of low normal stress in silicene. The silicene obtained on silver and gold substrates is not a subject for a large-scale use due to the high cost of the substrate materials. The aim of this work is to find a suitable low-cost substrate for the bulk production of silicene. In this work, three materials were investigated as a silicene substrate: Al, Ag, and Au. In all these cases, a metallic type of electronic conductivity was established in the silicene/substrate system. It turned out that the aluminum substrate provides an even better adhesion to silicene than the gold one. Silicene on the Al (111) substrate demonstrates the most uniform distribution of normal stresses with a minimum value of local bursts. Thus, aluminum seems to be quite a competitive material for the silicene production. The main obstacle in using aluminum substrates for the silicene production is strong oxidation in air.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physleta.2021.127487

Additional details

Identifiers

DOI
10.1016/j.physleta.2021.127487;
PII
S0375960121003510;

Publishing Information

Journal Title
Physics Letters. A
Journal Volume
408
Journal Page Range
vp.
ISSN
0375-9601
CODEN
PYLAAG

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.