Published March 21, 2001
| Version v1
Journal article
Capacitance of silicon pixels
Description
Capacitance measurements have been made on silicon pixel sensors of types n+ on n, p+on n, and n+ on p. The arrays test a variety of implant and gap widths, and the n+ on n devices test several p-stop designs. The measurements examine inter-pixel and backplane contributions and include studies of temperature dependence. Measurements were made before and after irradiation with fluences relevant to LHC experiments and Fermilab Tevatron Run 2
Additional details
Identifiers
- PII
- S0168900200010810;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
- Journal Volume
- 460
- Journal Issue
- 2-3
- Journal Page Range
- p. 336-351
- ISSN
- 0168-9002
- CODEN
- NIMAER
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Germany
- INIS RN
- 33047599
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- CAPACITANCE; JUNCTION DETECTORS; P-N JUNCTIONS; PHYSICAL RADIATION EFFECTS; POSITION SENSITIVE DETECTORS; SI SEMICONDUCTOR DETECTORS; SILICON; TEMPERATURE DEPENDENCE
- Descriptors DEC
- ELECTRICAL PROPERTIES; ELEMENTS; MEASURING INSTRUMENTS; PHYSICAL PROPERTIES; RADIATION DETECTORS; RADIATION EFFECTS; SEMICONDUCTOR DETECTORS; SEMICONDUCTOR JUNCTIONS; SEMIMETALS
Optional Information
- Copyright
- Copyright (c) 2001 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.