Published January 2006 | Version v1
Journal article

Effect of heat treatment on helium trapping in vanadium alloy at high ion implantation fluence

  • 1. Southwestern Institute of Physics, P.O. Box 432, Chengdu 610041, Sichuan (China)
  • 2. Laboratory of Plasma Physics and Engineering, Hokkaido University, Kita-13, Nishi-8, Kita-ku, Sapporo 060-8628 (Japan)

Description

Helium was implanted into a V-4Ti alloy by using a 5 keV helium ion beam with a flux of 1014 He/cm2 s, and then helium retention was analyzed by a technique of thermal desorption spectroscopy (TDS). The influence of heat treatment on helium trapping was studied by pre-annealing of the samples before ion irradiation. The annealing temperature was 973, 1223 and 1373 K, respectively. Results indicated that pre-annealing treatments did not influence significantly the helium retention and release behavior in vanadium alloy on the present experimental conditions where the helium ion implantation fluence is in the region of 1017-1018 He/cm2, which shows a different tendency from the situation at a low fluence region (1013-1014 He/cm2). The reason could be due to different trap mechanisms of helium at different ion fluences

Additional details

Identifiers

DOI
10.1016/j.nimb.2005.08.150;
PII
S0168-583X(05)01649-6;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
243
Journal Issue
1
Journal Page Range
p. 83-86
ISSN
0168-583X
CODEN
NIMBEU

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.