Published January 25, 1990 | Version v1
Journal article

Electrical contact studies of chemically treated YBa2Cu3O7-x surfaces

  • 1. Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA (USA)

Description

Results on electrical characterization of high Tc thin film surfaces modified by different surface treatments are presented. In particular, this work examines the effect of a Br/ethanol chemical etch, which has previously been shown to remove surface contamination while preserving the Cu(+2) oxidation state. Electrical measurements of YBa2Cu3O7-x/Au/Nb contact structures fabricated using polycrystalline, post-annealed YBa2Cu3O7-x films with Br-etched surfaces, show improvements of approximately one to two orders of magnitude in contact current densities and resistivities (resistance-area products) relative to unetched contacts. The Br-etch process has produced 10x10 μm2 contacts with contact current densities greater than 400 A/cm2 and RnA products as low as 4x10-7 Ω-cm2

Additional details

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
199
Journal Issue
1
Series
AIP Conf. Proc.
Journal Page Range
212-217
ISSN
0094-243X
CODEN
APCPC

Conference

Title
processing, characterization, and applications.
Acronym
3. annual topical conference on high T_c superconducting thin films
Dates
23-27 Oct 1989.
Place
Boston, MA (USA).

Optional Information

Secondary number(s)
CONF-891092--.