Published 2000 | Version v1
Journal article Metadata-only

Use of reactive ion etching of sapphire substrates in the molecular biology

Creators

  • 1. Instytut Inzynierii Materialowej, Wydzial Mechaniczny, Politechnika Lodzka, Lodz (Poland)
  • 2. Imperial College, London (United Kingdom)

Description

no abstract available

Additional details

Additional titles

Original title (Polish)
Wykorzystanie reaktywnego trawienia jonowego plytek szafirowych dla potrzeb biologii molekularnej

Publishing Information

Journal Title
Inzynieria Materialowa
Journal Volume
21
Journal Issue
6
Journal Page Range
p. 411-413
ISSN
0208-6247

Conference

Title
2. Polish Scientific Conference 'New Technologies in the Surface Engineering'
Original Conference Title
2. Ogolnopolska Konferencja Naukowa 'Nowe Technologie w Inzynierii Powierzchni'
Dates
12-14 Oct 2000
Place
Lodz-Spala (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
32029972
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
No Abstract, Conference
Descriptors DEI
ANISOTROPY; DIAGNOSTIC TECHNIQUES; ETCHING; IMAGES; ION BEAMS; MOLECULAR BIOLOGY; OPTICAL MICROSCOPY; PLASMA; ROUGHNESS; SAPPHIRE; SUBSTRATES; SURFACE PROPERTIES
Descriptors DEC
BEAMS; CORUNDUM; MICROSCOPY; MINERALS; OXIDE MINERALS; SURFACE FINISHING; SURFACE PROPERTIES

Optional Information

Contract/Grant/Project number
KBN grant 8T11E02417 and 4 Frame EU PL 930 782 1998-2000
Notes
12 refs, 3 figs, 1 tab