Published December 1994 | Version v1
Journal article

Theoretical examination of barium ions effect on the valent electron spectrum of silicon

Description

Theoretical examinations have shown that the generation of siliceous phases under the implantation of Ba into Si leads to the displacement of valent electrons spectrum by 0,7-0,8 eV, and the disorder of crystal structure of the surface shifts the spectrum by 0,3-0,4 eV. The calculated values of a shift of observed peaks satisfactory coincide with the experimental data. (author). 7 refs.; 1 fig

Additional details

Additional titles

Original title (Russian)
Теоретическое рассмотрение влияния имплантации ионов бария на спеcтр валентных електронов кремния

Publishing Information

Journal Title
Uzbekiston Fizika Zhurnali
Journal Volume
5
Journal Page Range
p. 39-43.
ISSN
1025-8817
CODEN
UFZHEX

INIS

Country of Publication
Uzbekistan
Country of Input or Organization
Uzbekistan
INIS RN
27030581
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BARIUM IONS; ELECTRON DENSITY; ION BEAMS; ION IMPLANTATION; KEV RANGE; PHYSICAL RADIATION EFFECTS; SILICON; VALENCE
Descriptors DEC
BEAMS; CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; IONS; RADIATION EFFECTS; SEMIMETALS