Published December 1994
| Version v1
Journal article
Theoretical examination of barium ions effect on the valent electron spectrum of silicon
Description
Theoretical examinations have shown that the generation of siliceous phases under the implantation of Ba into Si leads to the displacement of valent electrons spectrum by 0,7-0,8 eV, and the disorder of crystal structure of the surface shifts the spectrum by 0,3-0,4 eV. The calculated values of a shift of observed peaks satisfactory coincide with the experimental data. (author). 7 refs.; 1 fig
Additional details
Additional titles
- Original title (Russian)
- Теоретическое рассмотрение влияния имплантации ионов бария на спеcтр валентных електронов кремния
Publishing Information
- Journal Title
- Uzbekiston Fizika Zhurnali
- Journal Volume
- 5
- Journal Page Range
- p. 39-43.
- ISSN
- 1025-8817
- CODEN
- UFZHEX
INIS
- Country of Publication
- Uzbekistan
- Country of Input or Organization
- Uzbekistan
- INIS RN
- 27030581
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BARIUM IONS; ELECTRON DENSITY; ION BEAMS; ION IMPLANTATION; KEV RANGE; PHYSICAL RADIATION EFFECTS; SILICON; VALENCE
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; IONS; RADIATION EFFECTS; SEMIMETALS