Nanocrystalline Zn1−xMnxO thin film based transparent Schottky diodes
Creators
- 1. Department of Physics, Presidency University, Kolkata 700073 (India)
- 2. Birck Nanotechnology Center, Purdue University, IN 47907 (United States)
Description
Highly transparent and nanocrystalline Zn1−xMnxO (x = 0, 0.008, 0.017, 0.046) thin films have been synthesized by sol–gel spin coating technique on glass and SnO2 coated glass substrates. The microstructural and compositional analyses confirm the incorporation of Mn in hexagonal ZnO lattice without affecting its structure. Zn1−xMnxO thin films are highly transparent in the visible region of electromagnetic spectrum. The optical band gap, estimated from the transmittance spectra, decreases from 3.32 to 3.21 eV with the increase in Mn content in ZnO films. Photoluminescence study reveals that Mn introduces more defects in ZnO suppressing the excitonic recombination by the defect center (oxygen vacancy) induced recombination. The non-linear current–voltage characteristics at room temperature reveal Schottky barrier junction formation of Zn1−xMnxO films with Ag. The diode parameters, extracted from the thermionic emission model, vary with Mn incorporation in ZnO. Both the ideality factor and potential barrier height decrease from 6.5 and 0.63 for pure ZnO to 4.7 and 0.54 respectively, for Zn0.954Mn0.046O film. The series resistance that arises from the defect distributions at the interface and effects the charge transport through the junction, also decreases for higher percentage of Mn in Zn1−xMnxO thin films. - Highlights: • Mn doped transparent ZnO thin film synthesis using sol–gel spin coating • Particle size and optical band-gap decreases with increasing Mn doping. • Absence of any secondary phase upto 4.6 at.% of Mn which substitutes Zn sites in ZnO lattice • Interesting Schottky diode characteristics with Ag contact • Ideality factor and barrier height decreases with increasing Mn content.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2015.10.068Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2015.10.068;
- PII
- S0040-6090(15)01061-5;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 605
- Journal Page Range
- p. 248-256
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48020922
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHARGE TRANSPORT; CRYSTALS; DOPED MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRIC CONTACTS; INTERFACES; MICROSTRUCTURE; NANOSTRUCTURES; PHOTOLUMINESCENCE; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR JUNCTIONS; SOL-GEL PROCESS; SPIN-ON COATING; SUBSTRATES; SYNTHESIS; THERMIONIC EMISSION; THIN FILMS; TIN OXIDES; VACANCIES; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRICAL EQUIPMENT; ELECTRICAL PROPERTIES; EMISSION; EQUIPMENT; FILMS; LUMINESCENCE; MATERIALS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; PHYSICAL PROPERTIES; POINT DEFECTS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SURFACE COATING; TIN COMPOUNDS; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.