Published January 2009
| Version v1
Journal article
Ultra high-speed InP/InGaAs DHBTs with ft of 203 GHz
Creators
- 1. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
- 2. Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)
Description
InP/InGaAs/InP double heterojunction bipolar transistors (DHBTs) were designed for wide band digital and analog circuits, and fabricated using a conventional mesa structure with benzocyclobutene (BCB) passivation and planarization process techniques. Our devices exhibit a maximum ft of 203 GHz, which is the highest ft for DHBTs in mainland China. The emitter size is 1.0 x 20 μm2. The DC current gain β is 166, and BVCEO = 4.34 V. The devices reported here employ a 40 nm highly doped InGaAs base region and a 203 nm InGaAsP composite structure. They are suitable for high speed and intermediate power applications.
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/30/1/014002Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 30
- Journal Issue
- 1
- Journal Page Range
- [3 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41079270
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DOPED MATERIALS; GALLIUM ARSENIDES; GHZ RANGE 100-1000; HETEROJUNCTIONS; INDIUM ARSENIDES; INDIUM PHOSPHIDES; TRANSISTORS; VELOCITY
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; FREQUENCY RANGE; GALLIUM COMPOUNDS; GHZ RANGE; INDIUM COMPOUNDS; MATERIALS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR JUNCTIONS