Mitigation of tin whisker growth by inserting Ni nanocones
Creators
- 1. State Key Laboratory of Metal Matrix Composites, Key Laboratory for Thin Film and Microfabrication Technology of the Ministry of Education, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China)
Description
Highlights: • Tin whisker growth is mitigated effectively by inserting Ni nanocones. • Ni nanocones impede Sn dynamic recrystallization by blocking dislocation motions. • The inhibition method and mechanism are important to the study of tin whisker. - Abstract: An innovative controllable way has been proposed to mitigate tin whisker growth by inserting Ni nanocones prepared by electrodeposition. The results reveal that, after inserting Ni nanocones, tin whisker formation is mitigated effectively for 1.6 μm Sn coating but there is no inhibition effect for 4.5 μm Sn coating. The coatings are characterized by X-ray diffraction, scanning electron microscopy, energy dispersive spectrometer and electron backscatter diffraction (EBSD). The EBSD results show that Sn grain size without Ni nanocones increases significantly after indentation test compared with Sn grains with Ni nanocones. The inhibition effect of Ni nanocones on whisker growth can be ascribed to its specific structure which prevents dynamic recrystallization and produces horizontal grain boundaries of Sn grains. The structural inhibition method and mechanism proposed are of great importance to the research of tin whisker.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matchar.2017.11.002Additional details
Identifiers
- DOI
- 10.1016/j.matchar.2017.11.002;
- PII
- S1044580317316479;
Publishing Information
- Journal Title
- Materials Characterization
- Journal Volume
- 134
- Journal Page Range
- p. 354-361
- ISSN
- 1044-5803
- CODEN
- MACHEX
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50049225
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- BACKSCATTERING; COATINGS; COMPARATIVE EVALUATIONS; DISLOCATIONS; ELECTRODEPOSITION; ELECTRON DIFFRACTION; GRAIN BOUNDARIES; GRAIN SIZE; RECRYSTALLIZATION; SCANNING ELECTRON MICROSCOPY; TIN; WHISKERS; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; CRYSTALS; DEPOSITION; DIFFRACTION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; EVALUATION; LINE DEFECTS; LYSIS; METALS; MICROSCOPY; MICROSTRUCTURE; MONOCRYSTALS; SCATTERING; SIZE; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.