Published September 1, 2007 | Version v1
Journal article

Fabrication of back-illuminated, fully depleted charge-coupled devices

  • 1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720 (United States)

Description

We describe a fabrication strategy to produce fully depleted, back-illuminated charge-coupled devices (CCDs). Wafers are partially processed at a commercial foundry using standard processing techniques. The wafers are then thinned to the final desired thickness, and the processing steps necessary to produce back-illuminated devices are performed in our laboratory. The CCDs are then probed at wafer level, and we describe our techniques to screen for gate insulator flaws as well as defects on the back side of the wafer that are important for fully depleted devices

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nima.2007.05.265

Additional details

Identifiers

DOI
10.1016/j.nima.2007.05.265;
PII
S0168-9002(07)01156-4;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
579
Journal Issue
2
Journal Page Range
p. 653-657
ISSN
0168-9002
CODEN
NIMAER

Conference

Title
6. 'Hiroshima' symposium on the development and application of semiconductor detectors
Dates
11-15 Sep 2006
Place
Carmel, CA (United States)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39060960
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHARGE-COUPLED DEVICES; DEFECTS; EQUIPMENT; FABRICATION; FOUNDRIES; PROCESSING; SILICON; THICKNESS
Descriptors DEC
DIMENSIONS; ELEMENTS; INDUSTRIAL PLANTS; SEMICONDUCTOR DEVICES; SEMIMETALS

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.