Published December 2005
| Version v1
Journal article
Development of pure O2 cluster ion beam assisted deposition system
- 1. Graduate School of Engineering, University of Hyogo, 2167 Syosya, Himeji, Hyogo 671-2201 (Japan)
- 2. Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo, 3-1-2 Kouto, Kamigori, Hyogo 678-1205 (Japan)
Description
A newly designed high-current gas cluster ion beam (GCIB) assisted deposition system was developed and O2 cluster ion current over 100 μA was obtained with no monomer ions. High-current GCIB realizes high-rate deposition on large substrates. In this system, Ta2O5 and SiO2 films were deposited on Si and glass substrates by O2-GCIB assisted deposition. Very smooth surface (Ra < 0.5 nm), high refractive index (n = 2.2) and dense structure were obtained by optimizing deposition conditions. Also, more efficient surface smoothing and low damage irradiation effects were obtained by removing O2 monomer ions from O2-GCIB by using a permanent magnet
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2005.07.111;
- PII
- S0168-583X(05)01289-9;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 241
- Journal Issue
- 1-4
- Journal Page Range
- p. 626-629
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 18. international conference on the application of accelerators in research and industry
- Acronym
- CAARI 2004
- Dates
- 10-15 Oct 2004
- Place
- Fort Worth, TX (United States)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37065849
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DAMAGE; DEPOSITION; GLASS; ION BEAMS; ION PAIRS; IONS; IRRADIATION; MONOMERS; PERMANENT MAGNETS; REFRACTIVE INDEX; SILICA; SILICON OXIDES; SUBSTRATES; SURFACES; TANTALUM OXIDES; THIN FILMS
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLES; EQUIPMENT; FILMS; MAGNETS; MINERALS; OPTICAL PROPERTIES; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; REFRACTORY METAL COMPOUNDS; SILICON COMPOUNDS; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.