Published January 29, 2001
| Version v1
Journal article
Guidelines for selecting multi-technology recipes in multilayer filmstack measurements
Creators
- 1. Therma-Wave, 1250 Reliance Way, Fremont, California 94539 (United States)
Description
The conventional method for estimating the sensitivity of a given optical measurement for filmstack characterization is examined. A major limitation of this technique is that it overestimates the sensitivity for multiparameter film measurement. An alternative approach that provides guidelines for optimizing multi-technology optical metrology recipes is proposed, and examples with application to ONO and dual damascene copper stack measurement are given
Additional details
Identifiers
- DOI
- 10.1063/1.1354429;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 550
- Journal Issue
- 1
- Journal Page Range
- p. 385-391
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- IEEE international conference on characterization and metrology for ULSI technology
- Dates
- 26-29 Jun 2000
- Place
- Gaithersburg, MD (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35071788
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COPPER; ELLIPSOMETRY; FILMS; INTEGRATED CIRCUITS; MANUFACTURING; MEASURING METHODS; NONDESTRUCTIVE TESTING; SENSITIVITY; STANDARDS
- Descriptors DEC
- ELECTRONIC CIRCUITS; ELEMENTS; MATERIALS TESTING; MEASURING METHODS; METALS; MICROELECTRONIC CIRCUITS; TESTING; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2001 American Institute of Physics.