Published March 14, 2007 | Version v1
Journal article

Multiscale model of near-spherical germanium quantum dots in silicon

  • 1. Materials Reliability Division, National Institute of Standards and Technology, Boulder, CO 80305 (United States)

Description

Atomic displacements, strains and strain energies in the neighbourhood of near-spherical, coherent Ge 'quantum dots' (QD) in crystalline Si and near a {001} Si surface have been predicted by multiscale modelling, by use of a combination of classical molecular dynamics (MD) and Green's function (GF) techniques. The model includes the nonlinear effects at the GeSi interface and allows the boundary of the system to be placed outside the two million atom host crystallite. A modified-embedded-atom-model interatomic potential was used for both MD and GF calculations. Dots of four sizes were analysed, ranging in diameter from 1.1 to 6.5 nm. The supercell size was 34.2 nm. Calculations for strains and displacements in the infinite solid were extended to the {001} surface of the semi-infinite solid using the scheme described previously. Atomic displacements in the infinite solid showed trends generally similar to the early estimate of Mott and Nabarro, but differed in detail, especially for the smaller dots. Surface displacements were broadly similar in magnitude and shape to the classic isotropic continuum solution of Mindlin and Cheng. For large (e.g. 6.5 nm diameter) near-surface dots, the surface displacements are of a magnitude sufficient to be observed by advanced scanned probe microscopy

Additional details

Identifiers

DOI
10.1088/0957-4484/18/10/105402;
PII
S0957-4484(07)27261-7;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
18
Journal Issue
10
Journal Page Range
p. 105402
ISSN
0957-4484