Published July 25, 2005 | Version v1
Journal article

Light-induced defect creation in hydrogenated polymorphous silicon

  • 1. Department of Electrical and Digital-System Engineering, Hiroshima Institute of Technology, Miyake, Saeki-ku, Hiroshima 731-5193 (Japan)
  • 2. Electro-Chemical and Cancer Institute, Kokuryo, Chofu, Tokyo 182-0022 (Japan)
  • 3. Physics Laboratory, Meikai University, Urayasu, Chiba 279-8550 (Japan)
  • 4. Laboratoire de Physique des Interfaces et des Couches Minces, CNRS UMR 7647, Ecole Polytechnique, Palaiseau Cedex 91128 (France)

Description

Light-induced defect creation in hydrogenated polymorphous silicon (pm-Si:H) is investigated from electron spin resonance measurements and is compared with that in hydrogenated amorphous silicon (a-Si:H). Light-induced defect creation occurs at room temperature similarly for both types of films prepared at 250 deg. C. Thermal annealing of light-induced defects is also investigated as a function of temperature. Different behaviours of annealing characteristics for pm-Si:H from those for a-Si:H are observed and discussed. In particular, we observed a decrease of the light-induced defect creation efficiency with repeated light-soaking-annealing cycles and discuss it with respect to the hydrogen bonding in pm-Si:H films

Additional details

Identifiers

DOI
10.1016/j.mseb.2005.02.064;
PII
S0921-5107(05)00176-5;

Publishing Information

Journal Title
Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
Journal Volume
121
Journal Issue
1-2
Journal Page Range
p. 34-41
ISSN
0921-5107
CODEN
MSBTEK

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.