Published August 2004 | Version v1
Journal article Metadata-only

Application of microwave plasma technology to inertial confinement fusion target fabrication

Creators

  • 1. China Academy of Engineering Physics, Mianyang (China). Research Center of Laser Fusion

Description

This paper mainly discusses the application of microwave plasma technology in the field of the inertial confinement fusion (ICF) target fabrication, including films preparation, reactive ion beam etching (RIBE) and focused ion beam (FIB) etching, as well as the nano-metal particles synthesis and its surface polymer-coated modification. This technology is very useful to solve the problem occurred in ICF target fabrication and improve the quality of the ICF target produced. (author)

Additional details

Publishing Information

Journal Title
High Power Laser and Particle Beams
Journal Volume
16
Journal Issue
8
Journal Page Range
p. 1025-1028
ISSN
1001-4322

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
36071981
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ETCHING; FABRICATION; ICF DEVICES; ION BEAM TARGETS; ION BEAMS; MICROWAVE RADIATION; NANOSTRUCTURES; PLASMA; POLYMERS; SURFACE COATING
Descriptors DEC
BEAMS; DEPOSITION; ELECTROMAGNETIC RADIATION; RADIATIONS; SURFACE FINISHING; TARGETS; THERMONUCLEAR DEVICES

Optional Information

Notes
6 figs., 16 refs.