Morphological and microstructural characterization of nanostructured pure α-phase W coatings on a wide thickness range

Highlights: • Pure α-phase tungsten nanostructures were deposited by DC-magnetron sputtering. • Non-delaminated coatings were achieved at powers ≤50 W. • The coating thicknesses vary from 30 nm up to ∼4.0 μm. • The influence of the substrate on the coating properties was investigated. • We report on the morphological, microstructural and mechanical properties. - Abstract: Nanostructured tungsten (nanoW) coatings have been deposited by DC magnetron sputtering. First, the influence of the sputtering power on the adhesion of the coatings to the substrate was investigated by depositing coatings at powers varying from 30 up to 220 W. Non-delaminated coatings were achieved at powers ≤50 W. Second, the influence of coating thickness on the morphological, microstructural and mechanical properties was investigated for films deposited at 50 W with thicknesses varying from 30 nm up to ∼4.0 μm. SEM images reveal that all the films are highly compact, consisting of nanometer sized columns that grow perpendicular to the substrate. XRD data evidence that films are monophasic, being made of pure α-phase. All coatings show compressive stress and low micro-strain. Nanoindentation tests show that coatings have a hardness higher than that reported for coarse grained W. No significant dependence of the previous properties on coating thickness was observed. Finally, the influence of the substrate on coatings properties was studied, by depositing a W coating at a power of 50 W on a commercial steel substrate: no significant dependence was found