Published January 2021 | Version v1
Journal article

Ammonium chloride effects on bismuth electrodeposition in a choline chloride-urea deep eutectic solvent

  • 1. Laboratoire de Physique et Chimie des Matériaux (LPCM), Université Mouloud Mammeri de Tizi-Ouzou, RP 15000 (Algeria)
  • 2. University Grenoble Alpes, University Savoie Mont Blanc, CNRS, Grenoble INP, LEPMI, 38000 Grenoble (France)

Description

The ammonium chloride effect on bismuth electrodeposition from choline chloride-urea deep eutectic solvent (DES) was investigated. Spectroscopic and thermal studies were performed on the latter in order to understand whether the addition of ammonium chloride affects the DES behavior; the results of the thermal study do not indicate any significant change except a small shift in the melting point of the DES when adding the ammonium salt (~+3 °C) and the modification of a cold crystallization peaks at low scan rate. The electrochemical behavior of bismuth was then studied by cyclic voltammetry in the deep eutectic solvent with different NH4Cl content. Bismuth electrocrystallization was studied by chronoamperometry which has shown that the bismuth electrodeposition in studied conditions evolves with a three-dimensional progressive nucleation. SEM images show that grain size of bismuth deposits decreases while adopting a well-defined geometry as ammonium salt concentration increases. EDS analysis confirms that pure bismuth thin films were obtained and X-Ray diffraction indicates that the bismuth growth follows a preferential orientation along the (012) reticular plane.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.electacta.2020.137481

Additional details

Additional titles

Augmented title (English)
Bismuth;Ammonium chloride;Deep Eutectic Solvent;Electrodeposition;Nucleation

Identifiers

DOI
10.1016/j.electacta.2020.137481;
PII
S0013468620318740;

Publishing Information

Journal Title
Electrochimica Acta
Journal Volume
367
Journal Page Range
vp.
ISSN
0013-4686
CODEN
ELCAAV

Optional Information

Copyright
Copyright (c) 2020 Elsevier Ltd. All rights reserved.