Published November 1, 2013 | Version v1
Journal article

In situ RBS measurements for the effect of swift heavy ion irradiation on metal–insulator interfaces

  • 1. Department of Materials Science, Osaka Prefecture University, 1-1, Gakuen-cho, Sakai, Osaka 599-8531 (Japan)
  • 2. Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195 (Japan)

Description

We have studied the effect of 200 MeV Xe ion irradiation on Bi–Al2O3 and Au–Al2O3 interfaces by means of in situ Rutherford backscattering spectrometry (RBS). For the Bi–Al2O3 interface, we could observe a systematic change in RBS spectrum as a function of Xe ion fluence or the irradiation time. On the other hand, for Au–Al2O3 system, we could not observe any change in RBS spectrum. The experimental result confirmed our previous result that atomic mixing at Bi–Al2O3 interface surely occurs by the Xe ion irradiation. We analyzed the RBS spectra by the simulation software SIMNRA, and discussed the Bi–Al2O3 mixing quantitatively. From the irradiation time dependence of the mixing layer thickness, we estimated the effective diffusion constant for the atomic mixing at Bi–Al2O3 interface. Its value corresponds to the self-diffusion near the melting temperature of Al2O3. The result implies that Bi and Al2O3 are in molten forms during the ion irradiation, resulting in the atomic mixing at Bi–Al2O3 interface

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2013.05.046

Additional details

Identifiers

DOI
10.1016/j.nimb.2013.05.046;
PII
S0168-583X(13)00610-1;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
314
Journal Page Range
p. 176-179
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
8. international symposium on swift heavy ions in matter
Acronym
SHIM 2012
Dates
24-27 Oct 2012
Place
Kyoto (Japan)

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.