Preparation and properties of amorphous carbon films on the crystal silicon substrates by RF plasma

The amorphous carbon films are formed from benzene vapour using inductive-couple type radio-frequency (RF) plasma. Substrates are n- and p-type single crystal silicon. Transmission electron microscopy, scanning electron microscopy and secondary ion mass spectroscopy are used for analysis of the structure and composition of the carbon films. Electric and optical properties of the films are investigated by other methods. Experimental results indicate that the bias voltage, RF power and the partial pressure of benzene vapour all significantly affect the behaviour of the carbon films. If the bias voltage is higher than 700 V, a transparent film of high resistivity and high hardness will be formed. RF power has an influence upon the refractive index of the carbon films, it is between 1.9-2.1