Published June 15, 2011 | Version v1
Journal article

Stability and migration property of helium and self defects in vanadium and V-4Cr-4Ti alloy by first-principles

  • 1. College of Advanced Science and Technology and School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024 (China)
  • 2. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education, Dalian 116024 (China)
  • 3. State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004 (China)

Description

The stability and migration behavior of helium and self defects in vanadium and V-4Cr-4Ti alloy are studied by first-principles calculations. The tetrahedral site is found as the most stable configuration for interstitial He, followed by the octahedral and substitutional sites. Among the self defects, the monovacancy has lower formation energy (1.71 eV for V and 2.14 eV for V-4Cr-4Ti alloy) than the self interstitial ones. The migration energies for He hopping between the tetrahedral sites are 0.06 and 0.09 eV for vanadium and V-4Cr-4Ti alloy, respectively. Our calculations reveal strong repulsion between two interstitial He atoms and strong attraction between He and vacancy, suggesting that vacancy acts as a trapping site for He impurity and a seed for further bubble formation.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2011.03.031

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2011.03.031;
PII
S0022-3115(11)00299-6;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
413
Journal Issue
2
Journal Page Range
p. 90-94
ISSN
0022-3115
CODEN
JNUMAM

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.