Preliminary results for preparation and characterisation of immobilised humic acid on silicon wafer

To facilitate understanding the chemistry of the interactions of radionuclides with humic acid (HA) in microscopic scale, we have immobilized humic acid on silicon wafers. In this communication, we present a simple protocol to immobilise humic acid on silicon wafer surface. A trifunctional silane reagent 3-aminopropyltrimethoxysilane (APTES) was used to modify the surface of silicon wafers and appeared to be able to strongly attached soluble humic acid through their carboxylic groups to solid support. Humic acid, anchored in a following incubation step, were proved to be able to bind Am(III). (orig.)