Wettability analysis of laser deposited Ti:Sapphire
Creators
Description
The wetting properties for materials in the optical and microelectronic sector are of prime importance for a variety of process and preparation steps. Etching, and wafer direct bonding are only two of the relevant areas of application. Laser deposited Ti:Sapphire holds strong relevance for potential application on micro-electronic and micro-optical integration. The analysis of their wettability performance is therefore of relevance for potential engineering and manufacturing processes. In this paper, we evaluate the wettability of the deposited film systems, dependent on deposition parameters, to determine the polar and dispersive intermolecular forces of the material by using a control system of liquids. An interpretation of the results, in view of the deposition parameters and potential manufacturing applications is attempted
Additional details
Identifiers
- DOI
- 10.1016/S0169-4332(02)01417-4;
- arXiv
- arXiv:hep-ph/0110383v1;
- PII
- S0169433202014174;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 208-209
- Journal Issue
- 1
- Journal Page Range
- p. 651-657
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38086422
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ENERGY BEAM DEPOSITION; ETCHING; INTERMOLECULAR FORCES; LASER RADIATION; LASERS; PULSED IRRADIATION; SAPPHIRE; SILICON; THIN FILMS; TITANIUM; WETTABILITY
- Descriptors DEC
- CORUNDUM; DEPOSITION; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; IRRADIATION; METALS; MINERALS; OXIDE MINERALS; RADIATIONS; SEMIMETALS; SURFACE COATING; SURFACE FINISHING; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.