Published 1986 | Version v1
Book Metadata-only

Electron optical characterization of amorphous SiC:H CVD films

Creators

  • 1. Center For Advanced Materials, Lawrence Berkeley Lab., Univ. of California

Description

The utility of various electron optical methods to characterize the microstructure and composition of thin films of amorphous silicon-carbon films formed by plasma-activated CVD of SiH/sub 4/ and CH/sub 4/ has been investigated. The techniques employed include conventional and high resolution transmission electron microscopy and diffraction, non-dispersive x-ray spectroscopy and electron energy loss spectroscopy

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
0-931837-35-9
Imprint Title
Materials characterization
Journal Page Range
p. 153-158.

Conference

Title
Materials Research Society spring meeting.
Dates
15-18 Apr 1986.
Place
Palo Alto, CA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
18045456
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AMORPHOUS STATE; CHEMICAL ACTIVATION; CHEMICAL COMPOSITION; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; ELECTRON DIFFRACTION; ENERGY-LOSS SPECTROSCOPY; FABRICATION; METHANE; MICROSTRUCTURE; PLASMA; QUANTITATIVE CHEMICAL ANALYSIS; RESOLUTION; SILANES; SILICON CARBIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCO; X-RAY SPECTROSCOPY
Descriptors DEC
ALKANES; CARBIDES; CARBON COMPOUNDS; CHEMICAL ANALYSIS; CHEMICAL COATING; COHERENT SCATTERING; CRYSTAL STRUCTURE; DEPOSITION; DIFFRACTION; ELECTRON MICROSCOPY; FILMS; HYDRIDES; HYDROCARBONS; HYDROGEN COMPOUNDS; MICROSCOPY; ORGANIC COMPOUNDS; SCATTERING; SILICON COMPOUNDS; SPECTROSCOPY; SURFACE COATING