Published January 1, 2020 | Version v1
Journal article

High-quality 5 GeV electron bunches with resonant multi-pulse ionization injection

  • 1. Intense Laser Irradiation Laboratory, INO-CNR, Pisa (Italy)

Description

The production of high-quality electron bunches in laser wakefield acceleration relies on the possibility of injecting ultra-low emittance bunches in the plasma wave. A new bunch injection scheme (resonant multi-pulse ionization, ReMPI) has been conceived and studied, in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. Such a train of pulses can be obtained in a very efficient, compact and stable way, by phase manipulation in the laser front-end. The ReMPI injection scheme relies on currently available laser technology and is being considered for the implementation of future compact x-ray free electron laser schemes. Simulations show that high-quality electron bunches with an energy of up to 5 GeV and a peak current exceeding 2 kA, with normalized emittance of below 0.1 mm × mrad and a slice energy spread of below 0.1%, can be obtained with a single stage. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6587/ab45c5

Additional details

Identifiers

Publishing Information

Journal Title
Plasma Physics and Controlled Fusion
Journal Volume
62
Journal Issue
1
Journal Page Range
[8 p.]
ISSN
0741-3335
CODEN
PPCFET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52067678
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
FREE ELECTRON LASERS; GEV RANGE 01-10; IONIZATION; PLASMA WAVES; PULSES; SIMULATION; X RADIATION
Descriptors DEC
ELECTROMAGNETIC RADIATION; ENERGY RANGE; GEV RANGE; IONIZING RADIATIONS; LASERS; RADIATIONS