High-quality 5 GeV electron bunches with resonant multi-pulse ionization injection
Creators
- 1. Intense Laser Irradiation Laboratory, INO-CNR, Pisa (Italy)
Description
The production of high-quality electron bunches in laser wakefield acceleration relies on the possibility of injecting ultra-low emittance bunches in the plasma wave. A new bunch injection scheme (resonant multi-pulse ionization, ReMPI) has been conceived and studied, in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. Such a train of pulses can be obtained in a very efficient, compact and stable way, by phase manipulation in the laser front-end. The ReMPI injection scheme relies on currently available laser technology and is being considered for the implementation of future compact x-ray free electron laser schemes. Simulations show that high-quality electron bunches with an energy of up to 5 GeV and a peak current exceeding 2 kA, with normalized emittance of below 0.1 mm × mrad and a slice energy spread of below 0.1%, can be obtained with a single stage. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6587/ab45c5Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Physics and Controlled Fusion
- Journal Volume
- 62
- Journal Issue
- 1
- Journal Page Range
- [8 p.]
- ISSN
- 0741-3335
- CODEN
- PPCFET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52067678
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- FREE ELECTRON LASERS; GEV RANGE 01-10; IONIZATION; PLASMA WAVES; PULSES; SIMULATION; X RADIATION
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ENERGY RANGE; GEV RANGE; IONIZING RADIATIONS; LASERS; RADIATIONS