Determination of impurities at ultra trace level in high purity silicon samples by instrumental neutron activation analysis

High purity silicon is used for various applications, including semiconductor industry, solar cells, liquid crystal displays. The production of high purity materials requires expertise, dedicated facility, time and cost are invaluable, one cannot afford to loss of even the slightest of the sample. At the same time, quantification of trace / ultratrace impurities is an essential pre-requisite for qualifying the material for all such high precision applications. A non-destructive technique with proven accuracy and precision is required for such analyses