Published November 2019 | Version v1
Journal article

Investigation on the scaling performances of carbon‐doped Ge2Sb2Te5 thin films for phase change random access memory in a 40 nm process

  • 1. University of Chinese Academy of Sciences, Beijing (China)
  • 2. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai (China)

Description

Herein, the amorphous and crystalline characteristics at different thicknesses for carbon‐doped Ge2Sb2Te5 (CGST) thin films are systematically investigated. Switching current and grain size of the cubic (face‐centered cubic [FCC]) phase both reduce in thinner films, and the 35 nm‐thick CGST‐based chips can even switch in just 30 ns. Interestingly, high data retention (118 °C) is also maintained in 35 nm‐thick CGST‐based chips, better than the case in Ge2Sb2Te5‐based chips (85 °C). The endurance ability of more than 107 cycles with a resistance ratio of one order of magnitude demonstrates that the 35 nm‐thick CGST‐based chip is a potential candidate for the application of phase change random access memory. (© 2019 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Availability note (English)

Available from: http://dx.doi.org/10.1002/pssa.201900439

Additional details

Identifiers

Publishing Information

Journal Title
Physica Status Solidi A. Applications and Materials Science (Online)
Journal Volume
216
Journal Issue
22
Journal Page Range
p. 1-10
ISSN
1862-6319

Optional Information

Notes
AID: 1900439