Gas sensing using Tri-metal oxides for breathe analysis
Creators
- 1. Materials Engineering Departments, University of Technology, Baghdad/Iraq (Iraq)
Description
This article describes the use of a semiconductor gas sensor for disease diagnosis that may potentially serve as diagnostic tool handheld breath analyzer to provide detection device. Tri metal oxides were fabricated by a modified chemical spray pyrolysis technique by the mixing of tungsten and tin salts composition at (1:1, 3:1) respectively, with a concentration of (0.1M). The substrate used was silicon n-type at a temperature (500 ºC ±5), with spray distance (25 cm). Structural properties, including x-ray diffraction XRD, scanning electron microscopy SEM and atomic force microscopy AFM, were examined. Moreover, the gas sensing property toward nitrous oxide NO2 gas at a concentration of (10) ppm in air was investigated. Experimental results show formation of tri-metal oxide film (α-SnWO4) with wire and rods structures were achieved from the used salts, which make the sensor suitable for the detection of nitrous oxide levels in the exhaled human breath. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1757-899X/454/1/012060Additional details
Identifiers
Publishing Information
- Journal Title
- IOP Conference Series. Materials Science and Engineering (Online)
- Journal Volume
- 454
- Journal Issue
- 1
- Journal Page Range
- [7 p.]
- ISSN
- 1757-899X
Conference
- Title
- International Conference on Materials Engineering and Science
- Dates
- 8 Aug 2018
- Place
- Istanbul (Turkey)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52102089
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S47: OTHER INSTRUMENTATION;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; DETECTION; DIAGNOSIS; DIAGNOSTIC TECHNIQUES; NITROGEN DIOXIDE; NITROUS OXIDE; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SENSORS; SILICON; SUBSTRATES; THIN FILMS; TIN; TUNGSTEN; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; FILMS; MATERIALS; METALS; MICROSCOPY; NITROGEN COMPOUNDS; NITROGEN OXIDES; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METALS; SCATTERING; SEMIMETALS; THERMOCHEMICAL PROCESSES; TRANSITION ELEMENTS