Published 1988 | Version v1
Book

1064 nm and 350 nm laser damage thresholds of index oxide films deposited from organic solutions and sols

  • 1. Lawrence Livermore National Lab., Livermore CA (USA)

Description

High index optical coatings of the oxides TiO2, Ta2O5, ZrO2 and HfO2 have been prepared from solutions of metal organic precursors and from colloidal oxide suspensions. Room temperature processing gives porous coatings of comparatively low refractive index (1.8-1.9). Heat treatments can, in some cases, increase the index. Laser damage threshold levels at 1064 nm with a single 1 ns pulse are in the range 6-10 J/cm2, which is comparable with coatings of the same materials produced by electron beam evaporation. Lower figures are obtained at 350 nm with a 25 ns pulse under multishot (25 Hz) conditions

Additional details

Publishing Information

Publisher
US Government Printing Office.
Imprint Place
Washington, DC (USA)
Imprint Title
Laser induced damage in optical materials. 1986
Imprint Pagination
694 p.
Series
NIST special publication 752.
Journal Page Range
p. 361-364.

Conference

Title
18. symposium on optical materials for high power lasers.
Dates
3-5 Nov 1986.
Place
Boulder, CO (USA).

Optional Information

Secondary number(s)
CONF-861124--.