Published September 1975 | Version v1
Journal article

The ternary system nickel-boron-silicon

  • 1. Technische Hochschule Aachen (Germany, F.R.). Inst. fuer Werkstoffkunde

Description

The ternary system Nickel-Boron-Silicon was established at 8500C by means of X-ray diffraction, metallographic and micro-hardness examinations. The well known binary nickel borides and silicides resp. were confirmed. In the boron-silicon system two binary phases, SiBsub(4-x) with x approximately 0.7 and SiB6 were found the latter in equilibrium with the β-rhombohedral boron. Confirming the two ternary silicon borides a greater homogeneity range was found for Ni6Si2B, the phase Nisub(4,6)Si2B published by Uraz and Rundqvist can better be described by the formula Nisub(4.29)Si2Bsub(1.43). In relation to further investigations we measured melting temperatures in ternary Ni-10 B-Si alloys by differential thermoanalysis. (author)

Additional details

Additional titles

Original title (German)
Das Dreistoffsystem Nickel-Bor-Silicium

Identifiers

Publishing Information

Journal Title
Monatshefte für Chemie - Chemical Monthly
Journal Volume
106
Journal Issue
5
Series
Monatsh. Chem.
Journal Page Range
1155-1165
ISSN
0026-9247

Optional Information

Notes
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