Published March 19, 2008 | Version v1
Journal article Metadata-only

Material Dependence Of The contaminating Film Growth On In-Vessel Mirrors For Plasma Diagnostics

Creators

  • 1. Institute of Plasma Physics, NSC KIPT, Akademichna St. 1, 61108 Kharkov (Ukraine)
  • 2. Center for Energy Research, University of California at San Diego, La Jolla (United States)
  • 3. CEA/Cadarache-DRFC, F-13108 Saint Paul lez Durance (France)
  • 4. EPFL, Centre de Recherche en Physique des Plasmas, Assoc. EURATOM, Lausanne (Switzerland)
  • 5. ITER, Cadarache, F-13108 Saint Paul lez Durance (France)

Description

In this paper, the results of postmortem analysis of mirror samples exposed for the one-year campaign inside the Tore Supra (TS) tokamak and for shorter time inside the TCV tokamak are presented, together with results of laboratory mirror experiments. In TS, although all mirrors were eroded, the observed erosion rates do not correspond with the published sputtering yields. In TCV the thickness of the carbon-based film deposited on the mirror samples was found to depend on the mirror material, being several times higher on Si than on W and Mo substrates. An attempt is made to attract for explanation of results the difference in stickiness of carbon to SS and to Cu surfaces. The laboratory experiments qualitatively support such explanation

Additional details

Identifiers

DOI
10.1063/1.2909157;

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
993
Journal Issue
1
Journal Page Range
p. 395-398
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
International conference on research and applications of plasmas; 4. German-Polish conference on plasma diagnostics for fusion and applications; 6. French-Polish seminar on thermal plasma in space and laboratory
Acronym
PLASMA 2007
Dates
16-19 Oct 2007
Place
Greifswald (Germany)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40017605
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CARBON; CONTAINERS; EROSION; MIRRORS; MOLYBDENUM; PLASMA; PLASMA DIAGNOSTICS; SILICON; SPUTTERING; SUBSTRATES; SURFACES; TCV TOKAMAK; THERMONUCLEAR REACTOR MATERIALS; TORE SUPRA TOKAMAK; TUNGSTEN; WALL EFFECTS
Descriptors DEC
CLOSED PLASMA DEVICES; ELEMENTS; MATERIALS; METALS; NONMETALS; REFRACTORY METALS; SEMIMETALS; THERMONUCLEAR DEVICES; TOKAMAK DEVICES; TRANSITION ELEMENTS

Optional Information

Notes
(c) 2008 American Institute of Physics