Acoustic-phonon-assisted quantum control of qubit states near the Si/SiO2 interface
- 1. Department of Physics, Shijiazhuang University, Shijiazhuang 050035 (China)
- 2. College of Physics and Information Engineering, Hebei Advanced Thin Films Laboratory, Hebei Normal University, Shijiazhuang 050016 (China)
- 3. Department of Physics, Polytech Institute, New York University, Six MetroTech Center, Brooklyn, NY 11201 (United States)
Description
The waiting time between load/initialization and readout of electron spin qubit is related to electron tunneling between the donor and Si/SiO2 interface. Impacts of energy valley interference in silicon, lattice temperature, and screening of metallic gate on the waiting time associated with acoustic-phonon-assisted electron tunneling have been investigated. The results show that interface valley–orbit coupling causes its oscillation with donor depth and the influence of gate screening is significant when the SiO2 thickness is smaller than 10 nm. Moreover, the influences of these factors are strongest at critical electric field. -- Highlights: • Electron shuttling mediated by acoustic phonons for controlling electron spin qubits. • Energy valley interference, lattice temperature, and gate's screening effect. • Waiting time oscillates with donor depth due to interface valley-orbit coupling. • Gate's screening effect is significant when the SiO2 thickness is smaller than 10 nm. • The influences of all the factors are the strongest at critical electric field
Availability note (English)
Available from http://dx.doi.org/10.1016/j.physb.2013.06.023Additional details
Identifiers
- DOI
- 10.1016/j.physb.2013.06.023;
- PII
- S0921-4526(13)00386-4;
Publishing Information
- Journal Title
- Physica. B, Condensed Matter
- Journal Volume
- 427
- Journal Page Range
- p. 5-11
- ISSN
- 0921-4526
- CODEN
- PHYBE3
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45056995
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- COUPLING; ELECTRIC FIELDS; ELECTRONS; INTERFACES; INTERFERENCE; PHONONS; QUBITS; RABBIT TUBES; SILICA; SILICON; SILICON OXIDES; SPIN; THICKNESS; TUNNEL EFFECT
- Descriptors DEC
- ANGULAR MOMENTUM; CHALCOGENIDES; DIMENSIONS; ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; INFORMATION; LEPTONS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PARTICLE PROPERTIES; QUANTUM INFORMATION; QUASI PARTICLES; REACTION PRODUCT TRANSPORT SYSTEMS; REACTOR COMPONENTS; REACTOR EXPERIMENTAL FACILITIES; SEMIMETALS; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.