Published October 15, 2013 | Version v1
Journal article

Acoustic-phonon-assisted quantum control of qubit states near the Si/SiO2 interface

  • 1. Department of Physics, Shijiazhuang University, Shijiazhuang 050035 (China)
  • 2. College of Physics and Information Engineering, Hebei Advanced Thin Films Laboratory, Hebei Normal University, Shijiazhuang 050016 (China)
  • 3. Department of Physics, Polytech Institute, New York University, Six MetroTech Center, Brooklyn, NY 11201 (United States)

Description

The waiting time between load/initialization and readout of electron spin qubit is related to electron tunneling between the donor and Si/SiO2 interface. Impacts of energy valley interference in silicon, lattice temperature, and screening of metallic gate on the waiting time associated with acoustic-phonon-assisted electron tunneling have been investigated. The results show that interface valley–orbit coupling causes its oscillation with donor depth and the influence of gate screening is significant when the SiO2 thickness is smaller than 10 nm. Moreover, the influences of these factors are strongest at critical electric field. -- Highlights: • Electron shuttling mediated by acoustic phonons for controlling electron spin qubits. • Energy valley interference, lattice temperature, and gate's screening effect. • Waiting time oscillates with donor depth due to interface valley-orbit coupling. • Gate's screening effect is significant when the SiO2 thickness is smaller than 10 nm. • The influences of all the factors are the strongest at critical electric field

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physb.2013.06.023

Additional details

Identifiers

DOI
10.1016/j.physb.2013.06.023;
PII
S0921-4526(13)00386-4;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
427
Journal Page Range
p. 5-11
ISSN
0921-4526
CODEN
PHYBE3

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.