Published April 2010 | Version v1
Journal article

Measurement of the predicted asymmetric closing behaviour of the band gap of silicon using x-ray absorption and emission spectroscopy

  • 1. Institut fuer Experimentalphysik, Universitaet Hamburg and Centre for Free-Electron Laser Science, Luruper Chaussee 149, 22761 Hamburg (Germany)

Description

We experimentally observe the theoretically anticipated but so far unverified asymmetric band gap closing for the prototypical semiconductor silicon from room temperature up to the melting point. The shift of the valence band maximum contributes more than 60% to the band gap closing in comparison to the shift of the conduction band minimum. Since we determine the temperature-dependent band edge positions with x-ray absorption and x-ray emission spectroscopy, our analysis also includes electron-phonon coupling features and processes inherent to core-level spectroscopies, like the multi-electron screening response.

Availability note (English)

Available from http://dx.doi.org/10.1088/1367-2630/12/4/043011

Additional details

Publishing Information

Journal Title
New Journal of Physics
Journal Volume
12
Journal Issue
4
Journal Page Range
[9 p.]
ISSN
1367-2630