Electronic transport properties of 1D-defects in graphene and other 2D-systems
Creators
- 1. IV. Physical Institute, Solids and Nanostructures, Georg-August-University Goettingen (Germany)
- 2. Lehrstuhl fuer Festkoerperphysik, Universitaet Erlangen-Nuernberg, Erlangen (Germany)
Description
The continuous progress in device miniaturization demands a thorough understanding of the electron transport processes involved. The influence of defects - discontinuities in the perfect and translational invariant crystal lattice - plays a crucial role here. For graphene in particular, they limit the carrier mobility often demanded for applications by contributing additional sources of scattering to the sample. Due to its two-dimensional nature graphene serves as an ideal system to study electron transport in the presence of defects, because one-dimensional defects like steps, grain boundaries and interfaces are easy to characterize and have profound effects on the transport properties. While their contribution to the resistance of a sample can be extracted by carefully conducted transport experiments, scanning probe methods are excellent tools to study the influence of defects locally. In this letter, the authors review the results of scattering at local defects in graphene and other 2D systems by scanning tunneling potentiometry, 4-point-probe microscopy, Kelvin probe force microscopy and conventional transport measurements. Besides the comparison of the different defect resistances important for device fabrication, the underlying scattering mechanisms are discussed giving insight into the general physics of electron scattering at defects. (copyright 2017 by WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
Availability note (English)
Available from: http://dx.doi.org/10.1002/andp.201700003Additional details
Identifiers
Publishing Information
- Journal Title
- Annalen der Physik (Leipzig)
- Journal Volume
- 529
- Journal Issue
- 11
- Series
- Science and technology of graphene
- Journal Page Range
- p. 1-16
- ISSN
- 0003-3804
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 49021225
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRONIC STRUCTURE; GRAIN BOUNDARIES; GRAPHENE; INTERFACES; MAGNETIC FIELDS; POTENTIOMETRY; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SCATTERING; SILICON CARBIDES; SPATIAL RESOLUTION; STACKING FAULTS; SUBSTRATES; TEMPERATURE DEPENDENCE; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CARBIDES; CARBON; CARBON COMPOUNDS; CHEMICAL ANALYSIS; CHEMICAL COATING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; ELEMENTS; MICROSCOPY; MICROSTRUCTURE; MOBILITY; NONMETALS; PHYSICAL PROPERTIES; QUANTITATIVE CHEMICAL ANALYSIS; RESOLUTION; SILICON COMPOUNDS; SURFACE COATING; TITRATION; VOLUMETRIC ANALYSIS
Optional Information
- Notes
- With 10 figs., 3 tabs.