Published December 15, 2009 | Version v1
Journal article

Comparison of electron irradiation effects on diodes fabricated on silicon and on germanium doped silicon substrates

  • 1. Kumamoto National College of Technology, 2659-2 Suya Koshi, Kumamoto 861-1102 (Japan)
  • 2. Centro Nacional de Microelectronica (CNM-CSIC), Campus U.A.B, 08193, Bellaterra, Barcelona (Spain)
  • 3. IMEC, Kapeldreef 75, B-3001 Leuven (Belgium)
  • 4. State Key Laboratory of Silicon Materials, Zhejiang University, 310027 Hangzhou (China)
  • 5. Department of Solid State Sciences, Ghent University, Krijgslaan 281-S1, B-9000 Ghent (Belgium)

Description

Electron irradiation induced damage in diodes fabricated on germanium-doped and non-germanium-doped Czochralski (CZ) silicon substrates is studied. In general, both the reverse and forward current increase by irradiation. An interesting observation is, however, that the forward current decreases after 1017 e/cm2 irradiation for a forward voltage larger than ∼0.7 V. This reduction can be explained by an increased resistivity of the substrate. After irradiation, the capacitance decreases due to deactivation of the phosphorus dopant. From IV and CV characteristics, there is a limited difference between the effect of electron irradiation of CZ-SiGe and CZ-Si based diodes.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physb.2009.08.130

Additional details

Identifiers

DOI
10.1016/j.physb.2009.08.130;
PII
S0921-4526(09)00899-0;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
404
Journal Issue
23-24
Journal Page Range
p. 4671-4673
ISSN
0921-4526
CODEN
PHYBE3

Conference

Title
25. international conference on defects in semiconductors
Dates
20-24 Jul 2009
Place
St. Petersburg (Russian Federation)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.