Published 1991
| Version v1
Report
Overview of x-ray lithography at IBM using a compact storage ring
Description
This paper describes the feasibility studies being conducted at IBM to use x-ray lithography for production of high density silicon chips. The system approach to x-ray lithography adopted at IBM considering the interaction of all the components: x-ray source, masks, resists, exposure tools, with the devices and processes is presented in this paper. In particular, that status of the Advanced Lithography Facility which houses the electron storage ring x-ray source produced by IBM from Oxford Instruments, is presented
Additional details
Publishing Information
- Imprint Title
- Conference record of the 1991 IEEE particle accelerator conference: Accelerator science and technology. Volume 1 of 5
- Imprint Pagination
- 689 p.
- Journal Page Range
- p. 542-546.
- Report number
- DOE/ER/40607--1-Vol.1
Conference
- Title
- 1991 Institute of Electrical and Electronics Engineers (IEEE) particle accelerator conference (PAC).
- Dates
- 6-11 May 1991.
- Place
- San Francisco, CA (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 24002191
- Subject category
- S43: PARTICLE ACCELERATORS; S42: ENGINEERING;
- Resource subtype / Literary indicator
- Conference, Non-conventional Literature
- Descriptors DEI
- DESIGN; FABRICATION; FEASIBILITY STUDIES; INTEGRATED CIRCUITS; RADIATION EFFECTS; STORAGE RINGS; SUPERCONDUCTING MAGNETS; SYNCHROTRON RADIATION SOURCES; USES; X RADIATION; X-RAY SOURCES
- Descriptors DEC
- ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTROMAGNETS; ELECTRONIC CIRCUITS; EQUIPMENT; IONIZING RADIATIONS; MAGNETS; RADIATION SOURCES; RADIATIONS; SUPERCONDUCTING DEVICES
Optional Information
- Contract/Grant/Project number
- Contract AC02-76CH00016
- Secondary number(s)
- CONF-910505--Vol.1.