Published October 2011 | Version v1
Journal article Metadata-only

The Preparation and Characteristics of InxGa1−xN (0.06 ≤ x ≤ 0.58) Films Deposited by ECR-PEMOCVD

Creators

  • 1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
  • 2. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024 (China)

Description

We investigate the structural property and surface morphology of InxGa1−xN films for In compositions ranging from 0.06 to 0.58, which are deposited by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). The results of x-ray diffraction (XRD) in InGaN films confirm that they have excellent c-axis orientation. The In content in the InGaN epilayers is checked by electron probe microanalysis (EPMA), which reveals that In fractions determined by XRD are in good agreement with the EPMA results. Atomic force microscopy measurements reveal that the grown films have a surface roughness that varies between 4.16 and 8.14nm. The results suggest that it is possible to deposit high-c-axis-orientation InGaN films with different In contents. (cross-disciplinary physics and related areas of science and technology)

Availability note (English)

Available from http://dx.doi.org/10.1088/0256-307X/28/10/108104

Additional details

Identifiers

DOI
10.1088/0256-307X/28/10/108104;

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
28
Journal Issue
10
Journal Page Range
[4 p.]
ISSN
0256-307X
CODEN
CPLEEU

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45004406
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONCENTRATION RATIO; CRYSTAL GROWTH; ELECTRON CYCLOTRON-RESONANCE; ELECTRON MICROPROBE ANALYSIS; GALLIUM NITRIDES; INDIUM COMPOUNDS; MORPHOLOGY; ORGANOMETALLIC COMPOUNDS; ORIENTATION; PLASMA; ROUGHNESS; SURFACES; THIN FILMS; X-RAY DIFFRACTION
Descriptors DEC
CHEMICAL ANALYSIS; CHEMICAL COATING; COHERENT SCATTERING; CYCLOTRON RESONANCE; DEPOSITION; DIFFRACTION; DIMENSIONLESS NUMBERS; FILMS; GALLIUM COMPOUNDS; MICROANALYSIS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; NONDESTRUCTIVE ANALYSIS; ORGANIC COMPOUNDS; PNICTIDES; RESONANCE; SCATTERING; SURFACE COATING; SURFACE PROPERTIES