The quantum effects in the kinetics of 4He sorption by mesoporous materials
Creators
- 1. B. Verkin Institute for Low Temperature Physics and Engineering of the National Academy of Sciences of Ukraine, 47 Nauki Ave., Kharkov 61103 (Ukraine)
Description
The sorption and the desorption of 4He by the mesoporous silicate MCM-41 material have been investigated in the temperature interval 1,5-290 K. It is shown that at T = 25-290 K the thermal activation mechanism is dominant in the kinetics of the sorption of 4He atoms by the MCM-41 sample. Its activation energy was estimated to be E approx 164,8 K. At T = 12-23 K the diffusion of the 4He atoms in the MCM-41 was practically independent of temperature, which typically occurs when the tunnel mechanism of diffusion dominates over the thermal - activation one. The mobility of the 4He atoms in the MCM-41 channels changed at T = 6-12 K which may be indicative of the formation on cooling (or decay on heating) of the monolayer and subsequent 4He layers at the inner surfaces of the channels. Below 6 K the diffusion coefficients of 4He are only slightly dependent on temperature, which may be attributed to the behavior of the quantum 4He liquid in the MCM-41 channels covered with several layers of 4He atoms.
Additional details
Additional titles
- Original title (Russian)
- Квантовые эффекты в кинетике сорбции <суп>4</суп>Хе мезопористыми материалами
Publishing Information
- Journal Title
- Fizika Nizkikh Temperatur
- Journal Volume
- 42
- Journal Issue
- 2
- Journal Page Range
- p. 109-115
- ISSN
- 0132-6414
INIS
- Country of Publication
- Ukraine
- Country of Input or Organization
- Ukraine
- INIS RN
- 47078042
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADSORPTION; DESORPTION; DIFFUSION; HELIUM 4; POROUS MATERIALS; QUANTUM MECHANICS; SILICATES; TEMPERATURE RANGE 0000-0013 K; TEMPERATURE RANGE 0013-0065 K; TEMPERATURE RANGE 0065-0273 K
- Descriptors DEC
- EVEN-EVEN NUCLEI; HELIUM ISOTOPES; ISOTOPES; LIGHT NUCLEI; MATERIALS; MECHANICS; NUCLEI; OXYGEN COMPOUNDS; SILICON COMPOUNDS; SORPTION; STABLE ISOTOPES; TEMPERATURE RANGE