Published November 2009 | Version v1
Journal article

Kinetic modeling of the effect of electron beam pulse duration on abatement of carbon tetrafluoride using O2 as an additive gas

  • 1. National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568 (Japan)

Description

The abatement mechanism of carbon tetrafluoride (CF4) in atmospheric-pressured argon using O2 as an additive gas under electron beam irradiation and the effect of the pulse duration of electron beams on the abatement were studied by using a kinetic model. About 99% of 1000 ppm CF4 is abated for pulse duration from 0.1 to 10 μs and an input energy density of 0.85 J/cm3. The abatement of CF4 decreases to about 70% when the pulse duration becomes longer than 10 ms. This is because the decomposition of CF4 and other products by reaction with activated species and the composition of products by chemical reactions coexist.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Journal Volume
27
Journal Issue
6
Journal Page Range
p. 1271-1274
ISSN
1553-1813

Optional Information

Notes
(c) 2009 American Vacuum Society