Published September 1, 2013 | Version v1
Journal article

Initial oxidation behaviors of nitride surfaces of uranium by XPS analysis

  • 1. Science and Technology on Surface Physics and Chemistry Laboratory, P.O. Box 718-35, Mianyang 621907 (China)
  • 2. Department of Materials Science and Engineering, Zhejiang University, No. 38 Zheda Road, Hangzhou 310027 (China)
  • 3. China Academy of Engineering Physics, P.O. Box 919-71, Mianyang 621907 (China)

Description

The nitride surfaces of uranium were prepared by the surface glow plasma nitriding (SGPN) and plasma immersion ion implantation (PIII) methods. The initial oxidation behaviors of modified surfaces were studied by X-ray photoelectron spectroscopy (XPS). The SGPN on the uranium surface led to a single layer of uranium sesquinitride (U2N3), while the PIII on the surface resulted in a compound layer composed of U2N3 and uranium dioxide (UO2). The oxygen covered on these modified layers led to the formation of UO2 from U2N3 and U2N3 from UN. The oxidized nitrogen species were also observed on the two types of nitriding layers, with the discussion of the N–O coaction behaviors.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2013.04.147

Additional details

Identifiers

DOI
10.1016/j.apsusc.2013.04.147;
PII
S0169-4332(13)00867-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
280
Journal Page Range
p. 268-272
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.