Published 2019 | Version v1
Book

CFD simulation of low temperature chemical vapor deposition of silicon carbide for high temperature reactor

  • 1. Materials Group, Bhabha Atomic Research Centre, Mumbai (India)

Description

New technologies for suitably coating the fissile elements are called for in the advanced fuels in order to have safer reactors. There are several coating technologies with high temperature (generally > 2000 °C) or low temperature application (generally < 1500 °C). Uniformity in coating thickness is a major problem in all low temperature application process while high temperature application process has limited scope with respect to size of the sample to be coated. Nanostructured coating using chemical vapor deposition (CVD) is a new area where the corrosion resistance of coating is better than its counter parts

Part of:
Proceedings of the conference on indigenous nuclear fuel program in India - achievements, status and prospects: extended abstracts cum souvenir

Additional details

Publishing Information

Publisher
Bhabha Atomic Research Centre
Imprint Place
Mumbai (India)
Imprint Title
Proceedings of the conference on indigenous nuclear fuel program in India - achievements, status and prospects: extended abstracts cum souvenir
Imprint Pagination
408 p.
Journal Page Range
p. 167-169

Conference

Title
conference on indigenous nuclear fuel program in India - achievements, status and prospects
Acronym
INFPIN-2019
Dates
31 Jan - 2 Feb 2019
Place
Mumbai (India)

Optional Information