Published May 18, 2006 | Version v1
Journal article

Diluted magnetic semiconductor Ge1-xMn xTe films prepared by molecular beam epitaxy

  • 1. Data Storage Institute, 5 Engineering Drive 1, Singapore 117608 (Singapore)
  • 2. Information Storage Material Laboratory, Department of Electric and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore)

Description

We report the growth of IV-VI diluted magnetic semiconductor Ge1-xMn xTe thin films on BaF2 (111) substrates with high Mn ion concentration (x 0.98) by solid-source molecular-beam epitaxy. The film structure and orientation were characterized by in-situ reflection high-energy electron diffraction (RHEED) and X-ray diffraction (XRD). The chemical concentration was determined by X-ray Photoelectron Spectroscopy (XPS). The thin film shows ferromagnetic ordering at 130 K, as determined from temperature-dependent magnetization

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.10.023;
PII
S0040-6090(05)01937-1;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
505
Journal Issue
1-2
Journal Page Range
p. 145-147
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
International conference on materials for advanced technologies - Symposium D: Magnetic nanomaterials and devices
Acronym
ICMAT 2005
Dates
3-8 Jul 2005
Place
Singapore (Singapore)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.