Structural and optical properties of zinc oxide film using RF-sputtering technique

This paper reports the fabrication of zinc oxide (ZnO) film using RF-sputtering technique. Determination of the structural properties using High Resolution X-ray Diffraction (HRXRD) confirmed that ZnO film deposited on silicon (Si) substrate has a high quality. This result is in line with the Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) which were used to image the morphology of the film, in which a rough surface was demonstrated. Photoluminescence (PL) emission is included to study the optical properties of ZnO film that shows two PL peak in the UV region at 371 nm and in visible region at 530 nm respectively.