Published April 2018 | Version v1
Journal article

Dynamics of oxide growth on Pt nanoparticles electrodes in the presence of competing halides by operando energy dispersive X-Ray absorption spectroscopy

  • 1. Consorzio Interuniversitario di Scienze e Tecnologia Dei Materiali, Via San Giusti 9, 50121, Firenze (Italy)
  • 2. Dipartimento di Chimica, Università Degli Studi di Milano, Via Golgi 19, 20133, Milano (Italy)
  • 3. Dipartimento di Chimica, Università Degli Studi di Pavia, Viale Taramelli 13, 27100, Pavia (Italy)
  • 4. King Abdullah University of Science and Technology (KAUST), Biological and Environmental Sciences and Engineering (BESE) Division, NABLA Lab, 23955-6900 Thuwal (Saudi Arabia)

Description

In this work we studied the kinetics of oxide formation and reduction on Pt nanoparticles in HClO4 in the absence and in the presence of Br and Cl ions. The study combines potential step methods (i.e. chronoamperometry and choronocoulometry) with energy dispersive X-ray absorption spectroscopy (ED-XAS), which in principle allows to record a complete XAS spectrum in the timescale of milliseconds. Here, the information on the charge state and on the atomic surrounding of the considered element provided by XAS was exploited to monitor the degree of occupancy of 5d states of Pt in the course of oxide formation and growth, and to elucidate the competing halide adsorption/desorption phenomena. Electrochemical methods and XAS agree on the validity of a log(t) depending growth of Pt oxide, that is significantly delayed in the presence of Cl and Br anions. In the proximity of formation of one monolayer, the growth is further slowed down.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.electacta.2018.03.092

Additional details

Identifiers

DOI
10.1016/j.electacta.2018.03.092;
PII
S0013468618305942;

Publishing Information

Journal Title
Electrochimica Acta
Journal Volume
270
Journal Page Range
p. 378-386
ISSN
0013-4686
CODEN
ELCAAV

Optional Information

Copyright
Copyright (c) 2018 Elsevier Ltd. All rights reserved.