Published May 2018
| Version v1
Journal article
Air-Oxidation of Nb Nano-Films
Creators
- 1. National Research University MPEI (Russian Federation)
- 2. Chalmers University of Technology (Sweden)
- 3. IFW Dresden, Institute for Metallic Materials (Germany)
Description
X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.
Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductors
- Journal Volume
- 52
- Journal Issue
- 5
- Journal Page Range
- p. 678-682
- ISSN
- 1063-7826
- CODEN
- SMICES
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49100929
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- OXIDES; THICKNESS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; DIMENSIONS; ELECTRON SPECTROSCOPY; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2018 Pleiades Publishing, Ltd.