Published February 1, 2015 | Version v1
Journal article

Effect of Xe ion irradiation on photocatalytic performance of oblique TiO2 nanowire arrays

  • 1. Advanced Materials Laboratory (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)
  • 2. State Key Lab of New Ceramic and Fine Processing, School of Materials Science & Engineering, Tsinghua University, Beijing 100084 (China)

Description

Highlights: • Isolated and oblique TiO2 nanowire arrays were obtained by magnetron sputtering method and subsequent annealing. • The films were irradiated by Xe ion with different influences. • The photocatalytic property was studied upon UV irradiation. • The irradiated TiO2 nanowire arrays show superior photocatalytic activity. • The enhancement by Xe ion irradiation lays in induced Ti3+. - Abstract: In this work oblique TiO2 nanowire arrays (NWs) were prepared by magnetron sputtering method and irradiated by 200 keV Xe ion with different doses. The photocatalytic activity of TiO2 was studied by degrading methyl orange dye (MO) under ultraviolet (UV) light, which indicates that the photocatalytic performance of as-deposited and irradiated TiO2 NWs. It was found that when the dose was relatively low, the Ti3+ content on the surface was increased upon irradiation, dominating the enhancement of the photocatalytic property of the TiO2 NWs. By this means, an optimization of Xe ion dose can largely improve the photocatalytic performance of TiO2 NWs

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2014.12.009

Additional details

Identifiers

DOI
10.1016/j.apsusc.2014.12.009;
PII
S0169-4332(14)02696-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
327
Journal Page Range
p. 478-482
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.