Antireflective graded index silica coating, method for making
Creators
Description
Antireflective silica coating for vitreous material is substantially non-reflecting over a wide band of radiations. This is achieved by providing the coating with a graded degree of porosity which grades the index of refraction between that of air and the vitreous material of the substrate. To prepare the coating, there is first prepared a silicon-alkoxide-based coating solution of particular polymer structure produced by a controlled proportion of water to alkoxide and a controlled concentration of alkoxide to solution, along with a small amount of catalyst. The primary solvent is alcohol and the solution is polymerized and hydrolized under controlled conditions prior to use. The prepared solution is applied as a film to the vitreous substrate and rapidly dried. It is thereafter heated under controlled conditions to volatilize the hydroxyl radicals and organics therefrom and then to produce a suitable pore morphology in the residual porous silica layer. The silica layer is then etched in order to enlarge the pores in a graded fashion, with the largest of the pores remaining being sufficiently small that radiations to be passed through the substrate are not significantly scattered. For use with quartz substrates, extremely durable coatings which display only 0.1% reflectivity have been prepared
Availability note (English)
U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.Additional details
Publishing Information
- Imprint Pagination
- v p.
- IPC:
- Int. Cl. C03C 15/00.
- IPC
- Int. Cl. C03C 15/00.
- Patent number
- US patent document 4,535,026/A/
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 17031355
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- ANTIREFLECTION COATINGS; CATALYSIS; CHEMICAL COMPOSITION; CHEMICAL PREPARATION; ETCHING; FABRICATION; GLASS; HYDROLYSIS; HYDROXYL RADICALS; MICROSTRUCTURE; POLYMERS; POROSITY; QUARTZ; REFLECTION; REFRACTION; SILICON OXIDES; VOLATILITY
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; COATINGS; CRYSTAL STRUCTURE; DECOMPOSITION; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; RADICALS; SILICON COMPOUNDS; SOLVOLYSIS; SYNTHESIS
Optional Information
- Notes
- PAT-APPL-509118.