Published August 13, 1985 | Version v1
Patent

Antireflective graded index silica coating, method for making

Description

Antireflective silica coating for vitreous material is substantially non-reflecting over a wide band of radiations. This is achieved by providing the coating with a graded degree of porosity which grades the index of refraction between that of air and the vitreous material of the substrate. To prepare the coating, there is first prepared a silicon-alkoxide-based coating solution of particular polymer structure produced by a controlled proportion of water to alkoxide and a controlled concentration of alkoxide to solution, along with a small amount of catalyst. The primary solvent is alcohol and the solution is polymerized and hydrolized under controlled conditions prior to use. The prepared solution is applied as a film to the vitreous substrate and rapidly dried. It is thereafter heated under controlled conditions to volatilize the hydroxyl radicals and organics therefrom and then to produce a suitable pore morphology in the residual porous silica layer. The silica layer is then etched in order to enlarge the pores in a graded fashion, with the largest of the pores remaining being sufficiently small that radiations to be passed through the substrate are not significantly scattered. For use with quartz substrates, extremely durable coatings which display only 0.1% reflectivity have been prepared

Availability note (English)

U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.

Additional details

Publishing Information

Imprint Pagination
v p.
IPC:
Int. Cl. C03C 15/00.
IPC
Int. Cl. C03C 15/00.
Patent number
US patent document 4,535,026/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
17031355
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
ANTIREFLECTION COATINGS; CATALYSIS; CHEMICAL COMPOSITION; CHEMICAL PREPARATION; ETCHING; FABRICATION; GLASS; HYDROLYSIS; HYDROXYL RADICALS; MICROSTRUCTURE; POLYMERS; POROSITY; QUARTZ; REFLECTION; REFRACTION; SILICON OXIDES; VOLATILITY
Descriptors DEC
CHALCOGENIDES; CHEMICAL REACTIONS; COATINGS; CRYSTAL STRUCTURE; DECOMPOSITION; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; RADICALS; SILICON COMPOUNDS; SOLVOLYSIS; SYNTHESIS

Optional Information

Notes
PAT-APPL-509118.