Published March 1991
| Version v1
Journal article
Bias-sputtered Nb for reliable wirings in Josephson circuits
Creators
- 1. Fujitsu Lab., Ltd., 10-1 Morinosato-Wakamiya, Atsugi 243-01 (Japan)
Description
The authors applied bias-sputtered Nb films to wirings in Josephson circuits. Applying bias voltage during sputtering improved Nb step coverage and stability against annealing. Deteriorated superconducting characteristics in films were negligible for bias voltages less than -150 V. The authors studied the characteristics of contacts formed between two Nb wirings. By using bias-sputtered Nb as the upper wiring, the lc of the contacts increased 2--10 times. Reduction in contact Ic after annealing was markedly suppressed. This paper verifies that the bias-sputtered Nb was feasible in Josephson circuits as reliable wirings, with no compromise of junction characteristics
Additional details
Publishing Information
- Journal Title
- IEEE Transactions on Magnetics
- Journal Volume
- 27
- Journal Issue
- 2
- Series
- IEEE Trans. Magn.
- Journal Page Range
- 3176-3179
- ISSN
- 0018-9464
- CODEN
- IEMGA
Conference
- Title
- 1990 applied superconductivity conference.
- Dates
- 24-28 Sep 1990.
- Place
- Snowmass, CO (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 23020992
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; FABRICATION; JOSEPHSON JUNCTIONS; NIOBIUM; RELIABILITY; SPUTTERING; STABILITY; SUPERCONDUCTING FILMS; SUPERCONDUCTING WIRES
- Descriptors DEC
- ELEMENTS; FILMS; HEAT TREATMENTS; METALS; SEMICONDUCTOR JUNCTIONS; TRANSITION ELEMENTS; WIRES
Optional Information
- Secondary number(s)
- CONF-900944--.