Ferroelectric (K, Na)NbO3 films produced by HF cathode sputtering

Thin films of (K, Na)NbO3 composition were produced by HF cathode sputtering showing an agreement with technology of microelectronics and integral optics. Monophase films with clearly manifested ferroelectric properties (structural phase transformations, dielectric anomalies, loops of dielectric hysteresis, domains) formed in wide ranges of variation of formation conditions. Structural changes taking place under phase transformations in polycrystalline ferroelectric films were revealed for the first time. It was established that the absence of reflex splitting on X-ray diffraction patterns of polycrystalline ferroelectric films was the consequence of formation of the original domain texture due to the effect of sublayer residual stresses